Title

Metal nano-grating optimization for higher responsivity plasmonic-based GaAs metal-semiconductor-metal photodetector

Document Type

Journal Article

Publisher

Institute of Electrical and Electronics Engineers

Faculty

Faculty of Health, Engineering and Science

School

Electron Science Research Institute/Electron Science Research Institute

RAS ID

16641

Comments

This article was originally published as: Karar, A. , Tan, C., Alameh, K. , Lee, Y., & Karouta, F. (2013). Metal nano-grating optimization for higher responsivity plasmonic-based GaAs metal-semiconductor-metal photodetector. Journal of Lightwave Technology, 31(7), 1088-92. 10.1109/JLT.2013.2243108. Original article available here

Abstract

To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.

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