Impact of EDFA gain fluctuations on the response of Opto VLSI based reconfigurable photonic RF filters
Document Type
Conference Proceeding
Publisher
International Institute of Informatics and Systemics
Faculty
Faculty of Computing, Health and Science
School
Electron Science Research Institute (ESRI)
RAS ID
1873
Abstract
Opto-VLSI-based photonic signal processing is an attractive approach for realising reconfigurable RF filtering, where several high-Q Bragg cavities can be ontrolled to achieve a bandpass RF response with high skirt rejection. However, EDFA gain fluctuations are practically inevitable, and can cause instability in the RF frequency response of the photonic signal processor. In this paper, we investigate the impact of EDFA gain fluctuations on the response stability of Opto-VLSI based photonic filters, and evaluate the passband ripple level for different skirt rejection characteristics. Simulation results show that for a gain fluctuation of 0.1 dB, and maximum allowed ripple level of 1 dB, the minimum attainable shape factor of a 32-cavity Opto-VLSI based photonic RF filter is 5.5, which is 1.5 times higher than that attained by an EDFA-fluctuations-free photonic RF filter.
Comments
Alameh, K. , Eshraghian, K. , Ahderom, S. T., & Raisi, M. (2003). Impact of EDFA gain fluctuations on the response of Opto VLSI based reconfigurable photonic RF filters. Proceedings of The 7th world multiconference on systemic, cybernetics and informics. Orlando, United States. International Institute of Informatics and Systemics.