Light absorption enhancement in metal-semiconductor-metal photodetectors using plasmonic nanostructure gratings

Authors

Narottam Das, Edith Cowan University
Chee Leong Tan
Volodymyr V. Lysak
Kamal Alameh, Edith Cowan UniversityFollow
Yong Lee, Edith Cowan University

Document Type

Conference Proceeding

Publisher

HONET

Faculty

Faculty of Computing, Health and Science

School

Electron Science Research Institute (ESRI)

RAS ID

8590

Comments

Das, N. K., Tan, C., Lysak, V., Alameh, K. , & Lee, Y. T. (2009). Light absorption enhancement in metal-semiconductor-metal photodetectors using plasmonic nanostructure gratings. Proceedings of 6th International Symposium on High Capacity Optical Networks and Enabling Technologies. (pp. HS6-3). Alexandria, Egypt. Available here

Abstract

In this paper, we adopt the finite difference time-domain (FDTD) method to optimize the absorption of a novel metal-semiconductor-metal photodetector (MSM-PD) structure based on the use of a double-layer nanostructured metal grating. The metal fingers of the MSM-PDs are etched with appropriate depths to maximize light absorption through plasmonic effects. Simulation results show 40 times enhancement in 980 nm light trapping due to extraordinary optical signal propagation through the nanostructured double-metal grating, in comparison to conventional MSM-PDs.

DOI

10.1109/HONET.2009.5423095