Metal nano-grating optimization for higher responsivity plasmonic-based GaAs metal-semiconductor-metal photodetector

Document Type

Journal Article

Publisher

Institute of Electrical and Electronics Engineers

Faculty

Faculty of Health, Engineering and Science

School

Electron Science Research Institute

RAS ID

16641

Comments

Karar, A. , Tan, C., Alameh, K. , Lee, Y., & Karouta, F. (2013). Metal nano-grating optimization for higher responsivity plasmonic-based GaAs metal-semiconductor-metal photodetector. Journal of Lightwave Technology, 31(7), 1088-92. 10.1109/JLT.2013.2243108. Available here

Abstract

To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.

DOI

10.1109/JLT.2013.2243108

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