Document Type

Journal Article

Publisher

Royal Society of Chemistry

Faculty

Faculty of Computing, Health and Science

School

School of Engineering

RAS ID

15328

Comments

This article was originally published as: Xu, J., Lai, D., Xie, Z. , Munro, P., & Jiang, Z. (2012). A critical role for Al in regulating the corrosion resistance of nanocrystalline Mo(Si1−xAlx)2 films. Journal of Materials Chemistry, 22(6), 2596-2606. Original article available here

Abstract

Novel nanocrystalline Mo(Si 1-xAl x) 2 films, with differing Al contents were synthesized by double cathode glow discharge. The films exhibited a compact columnar microstructure having a pronounced (111) preferred orientation. The corrosion behaviour of these films were characterized by using various electrochemical techniques including open circuit potential (OCP), potentiodynamic polarization, and electrochemical impedance spectroscopy (EIS) in 3.5 wt% NaCl solution. The corrosion resistance of the films increased with increasing Al content in the as-synthesized films. The composition and chemical state of the passive layers formed on the films were investigated by X-ray photoelectron spectroscopy (XPS). It was demonstrated that the passive layer formed on the binary MoSi 2 film was highly enriched in SiO 2 with minor amounts of MoO 4 2-, MoO 2 and SiO x. With the increase of Al content in the films, Al 2O 3 was generated and incorporated into the passive layers, enhancing the corrosion resistance of the films by inhibiting the dissolution of Mo. Built upon the experimental results, the first-principles density-functional theory was applied to calculate the inter-atomic bonding strength in Mo(Si 1-xAl x) 2 and elucidate the role of Al in controlling the corrosion resistance of the films. The new findings lay a solid basis for the development and application of MoSi 2 based corrosion-resistant films.

DOI

10.1039/c1jm14744g

Included in

Engineering Commons

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