Enhanced corrosion-resistance in nanocrystalline MoSi 2 films enabled by Cr additions

Authors

Jiang Xu
D Lai
J Wu
Zonghan Xie, Edith Cowan University
P Munroe

Document Type

Journal Article

Keywords

Corrosion, First-principle calculation, Thin films, Transition metal silicidesCohesive energies, Cr addition, Double glow discharge, Electrochemical behaviors, Electrochemical techniques, First principle calculations, Interatomic bonds, Mulliken populations, NaCl solution, Nanocrystallines, Open circuit potential, Ti-6al-4v, Transition metal silicides, Calculations, Corrosion, Corrosion resistance, Density functional theory, Electrochemical impedance spectroscopy, Glow discharges, Silicides, Sodium chloride, Thin films, Transition metal compounds, Transition metals, Silicon

Faculty

Faculty of Computing, Health and Science

School

School of Engineering

RAS ID

15181

Comments

Xu, J., Lai, D., Wu, J., Xie, Z. , & Munroe, P. (2012). Enhanced corrosion-resistance in nanocrystalline MoSi 2 films enabled by Cr additions. Surface and Coatings Technology, 206(23), 4947-4951.

Abstract

Nanocrystalline C40-structured (Mo 1-xCr x)Si 2 films were engineered onto Ti6Al4V substrates by a double glow discharge plasma technique. The electrochemical behavior of the newly developed films in a 3.5wt.% NaCl solution was characterized by electrochemical techniques including open circuit potential, potentiodynamic polarization, and electrochemical impedance spectroscopy. To gain a deeper understanding of the role of Cr alloying in corrosion resistance, both cohesive energy and Mulliken population of the interatomic bonds in C40 (Mo 1-xCr x)Si 2 were calculated based on the first-principles density-functional theory.

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